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Implementation of simulation program for modeling the effective resistivity of nanometer scale film and line interconnects / A. Emre Yarimbiyik [and others].

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Series Information

NISTIR ; 7234.

Record details

  • Physical Description: 1 online resource (21 unnumbered page) : illustrations.
  • Publisher: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology, [2006]

Content descriptions

General Note:
"February 2006."
Contributed record: Metadata reviewed, not verified. Some fields updated by batch processes.
Title from page [1], viewed March 7, 2007.
Bibliography, etc. Note:
Includes bibliographical references.
Subject: Nanoelectromechanical systems.
Thin films > Size effects > Computer simulation.

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