Implementation of simulation program for modeling the effective resistivity of nanometer scale film and line interconnects / A. Emre Yarimbiyik [and others].
- Physical Description: 1 online resource (21 unnumbered page) : illustrations.
- Publisher: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology, 
Contributed record: Metadata reviewed, not verified. Some fields updated by batch processes.
Title from page , viewed March 7, 2007.
|Bibliography, etc. Note:||
Includes bibliographical references.
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Thin films > Size effects > Computer simulation.