Electron beam induced damage in PECVD Si₃N₄ and SiO₂ films on InP / Dragan M. Pantie [and four others].
- Physical Description: 1 online resource (15 pages) : illustrations.
- Publisher: Cleveland, Ohio : National Aeronautics and Space Administration, Lewis Research Center, 
|General Note:|| "Performing organization: National Aeronautics and Space Administration, Lewis Research Center"--Report documentation page.
|Bibliography, etc. Note:|| Includes bibliographical references (page 13).
|Type of Report and Period Covered Note:|| Technical memorandum.
|Funding Information Note:|| Sponsored by the National Aeronautics and Space Administration 506-44-21
|Source of Description Note:|| Description based on online resource; title from PDF title page (NASA, viewed July 24, 2017).
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